Speaker
Description
The aim of research is to evaluate how the nitrogen flow in a HiPIMS system affected plasma and microstructural characterization during the deposition of TiAlTaNbZrN. First, the synthesis conditions for producing the TiAlTaNbZr metallic coatings were optimized by varying the pressure and substrate bias in orden to identify the best conditions in terms of FCC structure (using X-Ray Diffraction (XRD)) and adhesion (using Scratch Test). Subsequently, TiAlTaNbZrN coatings were deposited varying nitrogen flows, and simultaneously the plasma parameters were studied using Optical Emission Spectroscopy (OES). Lastly, the results of plasma characterization were correlated with the microstructure and chemical composition of the films deposited, using XRD for determining crystalline structure and Energy Dispersive Spectroscopy (EDS) for determining the elemental concentration.
Reference
L. Wang, J. Jin, C. Zhu, G. Li, X. Kuang, y K. Huang, “Effects of HiPIMS pulse-length on
plasma discharge and on the properties of WC-DLC coatings”, Appl Surf Sci, vol. 487,
pp. 526–538, sep. 2019, doi: 10.1016/J.APSUSC.2019.05.046.
This work was supported by
Universidad Nacional de Colombia
| Keywords | Sputtering, HiPIMS, TiAlTaNbZrN, Optical, Plasma |
|---|---|
| Author approval | I confirm |
| Author will attend | I confirm |
