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One of the important physical properties to consider in a semiconductor window is the value of its band-gap Eg. In2S3 and CdS have typical Eg of the order of 2.42 and 2.62 eV, respectively; that is, their absorption window is in the visible light region. In this work, different configurations of these semiconductors were processed by means of the processing technique Magneto-Planar Cathode Sputtering in Radio Frequency mode (Sputtering-RF) in an Ar+O2 atmosphere, such as: In2S3/CdS, In2S3 :O2/CdS, In2S3/CdS:O2 and In2S3:O2/CdS:O2; with the purpose of studying the change in the optoelectrical properties of these window Semiconductors. In2S3 and CdS semiconductors, when deposited together sequentially in Sputtering-RF in an Ar atmosphere with the parameters: RF source power (Pot = 150 and 100 W, respectively), substrate temperature (Ts = 250 and 225 °C, respectively) and deposition pressure (P = 10 and 12.5 mTorr, respectively), has a thickness of approximately 150 nm (In2S3 = 50 nm and CdS = 100 nm) and an average deposition rate of approximately 6 nm/min; whereas, when these same semiconductors are deposited in an O2 atmosphere with a flux of 1.0 sccm (5% of the total Ar+O2 flow entering the deposition chamber, approximately). As results we obtained that the mentioned configurations and with these same deposition parameters; the thickness decreases around 125 nm (average deposition rate of 5 nm/min); as well as other optical and morphological changes, such as: the absorption window is shifted towards the UV region (370 nm), for the In2S3 :O2/CdS:O2 configuration; attractive properties for the mentioned applications.
Reference
Materials Research Express
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Incorporation of an efficient β-In2S3 thin film as window material into CdTe photovoltaic devices Mater.Res.Express6(2019)125510 https://doi.org/10.1088/2053-1591/ab5508
This work was supported by
This work was supported through the scholarship programs PIFI-IPN, BEIFI, SIP-IPN 20240682, UACM-CCYT2023-IMP-01 AND CONAHCyT.
Keywords | Window materials, Thin films, Sputtering-RF |
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